Plasma processing apparatus and plasma processing method

ABSTRACT

A plasma processing apparatus includes a cooling plate having a fixing surface to which an upper electrode is fixed, the cooling plate having, on the fixing surface, an electrostatic chuck configured to attract the upper electrode by an attraction force generated by an applied voltage; a power supply configured to apply the voltage to the electrostatic chuck; and a power supply controller configured to control the power supply such that an absolute value of the voltage applied to the electrostatic chuck is increased based on a degree of consumption of the upper electrode.

CROSS-REFERENCE TO RELATED APPLICATION

This is a continuation application of U.S. patent application Ser. No.16/565,651 filed on Sep. 10, 2019 which claims the benefit of JapanesePatent Application No. 2018-187411 filed on Oct. 2, 2018, the entiredisclosures of which are incorporated herein by reference.

TECHNICAL FIELD

The various aspects and embodiments described herein pertain generallyto a plasma processing apparatus and a plasma processing method.

BACKGROUND

Conventionally, there is known a plasma processing apparatus configuredto perform a plasma processing such as etching on a processing targetobject such as a semiconductor wafer by using plasma. Such a plasmaprocessing apparatus includes, for example, a lower electrode configuredto hold the processing target object and an upper electrode disposedabove the lower electrode. The plasma processing apparatus performs theplasma processing on the processing target object by applying a presethigh frequency power to the lower electrode or the upper electrode.Further, in the plasma processing apparatus, the upper electrode isfixed to a cooling plate having a cooling device.

Patent document 1 discloses a technique of allowing the upper electrodeand the cooling plate to firmly adhere to each other in the plasmaprocessing apparatus. That is, an electrostatic chuck is provided on afixing surface of the cooling plate to which the upper electrode isfixed, and the upper electrode is attracted to the electrostatic chuckby applying a preset voltage to the electrostatic chuck during aprocessing period of the plasma processing.

Patent Document 1: Japanese Translation of PCT Application PatentPublication No. 2004-538633

SUMMARY

In one exemplary embodiment, a plasma processing apparatus includes acooling plate; an upper electrode; an electrostatic chuck providedbetween the cooling plate and the upper electrode and configured toattract the upper electrode; a power supply configured to apply avoltage to the electrostatic chuck; and a power supply controllerconfigured to control an absolute value of the voltage applied to theelectrostatic chuck from the power supply. The power supply controllerperforms controlling the power supply such that the absolute value isincreased based on a degree of consumption of the upper electrode.

The foregoing summary is illustrative only and is not intended to be anyway limiting. In addition to the illustrative aspects, embodiments, andfeatures described above, further aspects, embodiments, and featureswill become apparent by reference to the drawings and the followingdetailed description.

BRIEF DESCRIPTION OF THE DRAWINGS

In the detailed description that follows, embodiments are described asillustrations only since various changes and modifications will becomeapparent to those skilled in the art from the following detaileddescription. The use of the same reference numbers in different figuresindicates similar or identical items.

FIG. 1 is a cross sectional view illustrating a configuration example ofa plasma processing apparatus according to an exemplary embodiment;

FIG. 2 is a cross sectional view illustrating an example of aconfiguration of main parts of a shower head in the exemplaryembodiment;

FIG. 3 is a block diagram illustrating a configuration example of acontroller configured to control the plasma processing apparatusaccording to the exemplary embodiment;

FIG. 4 is a diagram for describing an example of consumption of anelectrode plate; and

FIG. 5 is a flowchart illustrating an example of a flow of anelectrostatic attraction processing according to the exemplaryembodiment.

DETAILED DESCRIPTION

In the following detailed description, reference is made to theaccompanying drawings, which form a part of the description. In thedrawings, similar symbols typically identify similar components, unlesscontext dictates otherwise. Furthermore, unless otherwise noted, thedescription of each successive drawing may reference features from oneor more of the previous drawings to provide clearer context and a moresubstantive explanation of the current exemplary embodiment. Still, theexemplary embodiments described in the detailed description, drawings,and claims are not meant to be limiting. Other embodiments may beutilized, and other changes may be made, without departing from thespirit or scope of the subject matter presented herein. It will bereadily understood that the aspects of the present disclosure, asgenerally described herein and illustrated in the drawings, may bearranged, substituted, combined, separated, and designed in a widevariety of different configurations, all of which are explicitlycontemplated herein.

Hereinafter, various exemplary embodiments will be described in detailwith reference to the accompanying drawings. In the various drawings,same or corresponding parts will be assigned same reference numerals.

[Configuration of Plasma Processing Apparatus 10]

FIG. 1 is a cross sectional view illustrating a configuration example ofa plasma processing apparatus 10 according to an exemplary embodiment.In FIG. 1 , the plasma processing apparatus 10 is equipped with acylindrical chamber 11, made of aluminum or the like, having a sealableinside. The chamber 11 is grounded. A placing table 12 made of aconductive material such as, but not limited to, aluminum is providedwithin the chamber 11. The placing table 12 is a cylindrical tableconfigured to place thereon a semiconductor wafer (hereinafter, simplyreferred to as “wafer”) W as an example of a processing target object.This placing table 12 also serves as a lower electrode.

Formed between a sidewall of the chamber 11 and a side surface of theplacing table 12 is an exhaust path 13 configured as a path throughwhich a gas above the placing table 12 is exhausted to the outside ofthe chamber 11. An exhaust plate 14 is placed at a portion of theexhaust path 13. The exhaust plate 14 is a plate-shaped member having amultiple number of holes, and serves as a partition plate whichpartitions the chamber 11 into an upper section and a lower section. Theupper section of the chamber 11 partitioned by the exhaust plate 14 is areaction chamber 17 in which a plasma etching is performed. Further, anexhaust pipe 15 through which a gas within the chamber 11 is exhaustedis connected to an exhaust chamber (manifold) 18 in the lower section ofthe chamber 11. The exhaust plate 14 serves to capture or reflect plasmagenerated in the reaction chamber 17 to suppress a leak of the plasmainto the exhaust chamber 18. The exhaust pipe 15 is connected to anexhaust device via an APC (Adaptive Pressure Control) valve 16. Theexhaust device decompresses the chamber 11 and maintains the inside ofthe chamber 11 in a preset vacuum level.

A first high frequency power supply 19 is connected to the placing table12 via a matching device 20. The first high frequency power supply 19 isconfigured to supply a high frequency bias power ranging from, e.g., 400kHz to 13.56 MHz to the placing table 12. The matching device 20 isconfigured to suppress reflection of the high frequency power from theplacing table 12, thus maximizing efficiency for the supply of the highfrequency bias power to the placing table 12.

An electrostatic chuck 22 having an electrostatic electrode plate 21therein is provided on a top surface of the placing table 12. When thewafer W is placed on the placing table 12, the wafer W is placed on theelectrostatic chuck 22. The electrostatic electrode plate 21 isconnected to a first DC power supply 23. The electrostatic chuck 22generates an electrostatic force such as a Coulomb force by applying avoltage to the electrostatic electrode plate 21 from the first DC powersupply 23. Thus, the wafer W is attracted and held by the electrostaticforce.

Further, a circular ring-shaped focus ring 24 is disposed on theelectrostatic chuck 22 to surround an edge of the wafer W. The focusring 24 is made of a conductive member such as, but not limited to,silicon.

Furthermore, an annular coolant path 25 extending in, for example, acircumferential direction is provided within the placing table 12. Acoolant of a low temperature such as cooling water or Galden (registeredtrademark) is supplied into the coolant path 25 from a chiller unit viaa coolant pipeline 26 to be circulated therein. The placing table 12cooled by this coolant of the low temperature cools the wafer W and thefocus ring 24 via the electrostatic chuck 22.

In addition, a multiple number of heat transfer gas supply holes 27 areopened in the electrostatic chuck 22. A heat transfer gas such as ahelium (He) gas is supplied into these heat transfer gas supply holes 27via a heat transfer gas supply line 28. The heat transfer gas issupplied into a gap between an attraction surface of the electrostaticchuck 22 and a rear surface of the wafer W through the heat transfer gassupply holes 27. The heat transfer gas supplied into this gap serves totransfer heat of the wafer W to the electrostatic chuck 22.

A shower head 29 is disposed at a ceiling of the chamber 11, facing theplacing table 12. The shower head 29 is connected to a second highfrequency power supply 31 via a matching device 30. The second highfrequency power supply 31 is configured to supply a high frequency powerfor plasma excitation having a frequency of, e.g., 40 MHz to the showerhead 29. The matching device 30 is configured to suppress reflection ofthe high frequency power from the shower head 29, thus maximizingefficiency for the supply of the high frequency power for plasmaexcitation to the shower head 29. Further, this high frequency power forplasma excitation may be applied to the placing table 12.

The shower head 29 includes: an upper electrode 33 having a multiplenumber of gas holes 32; a cooling plate 34 configured to support theupper electrode 33 while allowing the upper electrode 33 to be suspendedin a detachable manner; and a cover body 35 covering the cooling plate34. Further, a buffer room 36 is provided within the cooling plate 34,and a gas inlet line 37 is connected to the buffer room 36. The showerhead 29 diffuses a gas supplied from the gas inlet line 37 in the bufferroom 36 and supplies the diffused gas into the reaction chamber 17through the multiple number of gas holes 32.

The cooling plate 34 is equipped with a cooling mechanism and cools theupper electrode 33. The cooling mechanism includes: a spiral-shaped or aring-shaped coolant path 38 extending in a circumferential directionthereof; and a coolant pipeline 38 a. A coolant of a low temperaturesuch as cooling water or Galden (registered trademark) is supplied intothe coolant path 38 from a chiller unit via the coolant pipeline 38 a tobe circulated therein. A temperature of the upper electrode 33 isincreased by the heat transferred from the plasma. As a resolution, inthe plasma processing apparatus 10 according to the exemplaryembodiment, by configuring the upper electrode 33 and the cooling plate34 to firmly adhere to each other via the electrostatic chuck 41, theheat of the upper electrode 33 is transferred to the cooing plate 34. Asa result, the upper electrode 33 is cooled.

The shower head 29 is configured to be detachable with respect to thechamber 11, and also serves as a cover of the chamber 11. If the showerhead 29 is separated from the chamber 11, an operator can access a wallsurface of the chamber 11 and constituent components therein.Accordingly, the operator can clean the wall surface of the chamber 11and surfaces of the constituent components, thus removing a depositadhering to the wall surface of the chamber 11 or the like.

An overall operation of the plasma processing apparatus 10 having theabove-described configuration is controlled by a controller 100. Thecontroller 100 is implemented by, for example, a computer and controlsindividual components of the plasma processing apparatus 10. The overalloperation of the plasma processing apparatus 10 is controlled by thecontroller 100.

[Configuration of Shower Head 29]

Now, main parts of the shower head 29 will be explained with referenceto FIG. 2 . FIG. 2 is a cross sectional view illustrating an exampleconfiguration of the main parts of the shower head 29 according to theexemplary embodiment.

The shower head 29 is equipped with the upper electrode 33, the coolingplate 34 and a clamp member 40.

The upper electrode 33 is a disk-shaped member and made of a conductivematerial such as, but not limited to, silicon. The upper electrode 33 isprovided with the multiple number of gas holes 32 through which aprocessing gas is passed (see FIG. 1 ).

The cooling plate 34 is a disk-shaped member and made of a conductivematerial such as, but not limited to, aluminum. A bottom surface of thecooling plate 34 is configured as a fixing surface 34 a to which theupper electrode 33 is fixed. The clamp member 40 presses the peripheralportion of the upper electrode 33 against the fixing surface 34 a of thecooling plate 34 via a screw 40 a, so that the clamp member 40 holds theupper electrode 33.

An electrostatic chuck 41 is provided on the fixing surface 34 a of thecooling plate 34. The electrostatic chuck 41 is inserted between thefixing surface 34 a of the cooling plate 34 and the upper electrode 33.The electrostatic chuck 41 includes a pair of dielectric films and anelectrode plate 42 embedded between the pair of dielectric films. Theelectrode plate 42 is made of a conductive film. The electrode plate 42is electrically connected with a second DC power supply 43. The secondDC power supply 43 is configured to vary an absolute value of a DCvoltage generated therefrom. The second DC power supply 43 applies theDC voltage to the electrode plate 42 under the control of the controller100. The electrostatic chuck 41 generates an electrostatic force such asa Coulomb force by the voltage applied to the electrode plate 42 fromthe second DC power supply 43. Thus, the upper electrode 33 is attractedand held by the electrostatic chuck 41.

Further, the electrostatic chuck 41 shown in FIG. 2 is configured as aunipolar type. In this case, in a period during which plasma isgenerated, the upper electrode 33 is held by the electrostatic chuck 41,and in a rest period rather than the period, the upper electrode 33 isheld by the clamp member 40. However, the electrostatic chuck 41 may beconfigured as a bipolar type. To be specific, the electrostatic chuck 41may be configured such that a first electrode and a second electrode areprovided between a pair of dielectric film and voltages of differentpolarity may be applied to the first electrode and the second electrode.In this case, the upper electrode 33 is held by the electrostatic chuck41 regardless of presence/absence of the plasma.

[Configuration of Controller 100]

Now, the controller 100 will be elaborated. FIG. 3 is a block diagramillustrating a configuration example of the controller 100 configured tocontrol the plasma processing apparatus 10 according to the exemplaryembodiment. The controller 100 includes a process controller 101, a userinterface 102 and a storage 103.

The process controller 101 is equipped with a CPU (Central ProcessingUnit) and controls the individual components of the plasma processingapparatus 10.

The user interface 102 includes a keyboard through which a processmanager inputs a command to manage the plasma processing apparatus 10, adisplay configured to visually display an operational status of theplasma processing apparatus 10, and so forth.

The storage 103 stores therein a control program (software) forimplementing various kinds of processings in the plasma processingapparatus 10 under the control of the process controller 101, and arecipe including processing condition data or the like. Further, thestorage 103 stores therein various kinds of information for coping withthe deterioration of the adhesiveness between the upper electrode 33 andthe cooling plate 34 due to the consumption of the upper electrode 33.By way of example, the storage 103 stores therein consumptioninformation 103 a indicating the degree of consumption of the upperelectrode 33 and voltage information 103 b indicating the absolute valueof the DC voltage applied to the electrostatic chuck 41 (that is, theelectrode plate 42). Further, the control program and the recipeincluding the processing condition data may be used by being stored in acomputer-readable recording medium (for example, a hard disk, an opticaldisk such as a DVD, a flexible disk, a semiconductor memory, or thelike) or may be used on-line by being transmitted from another apparatusthrough, for example, a dedicated line whenever necessary.

The process controller 101 has an internal memory for storing a programand data. The process controller 101 reads out the control programstored in the storage 103 and executes the read-out control program. Asthe control program is operated, the process controller 101 serves asvarious kinds of processors. By way of example, the process controller101 has a measurement device 101 a and a power supply controller 101 b.Although the plasma processing apparatus 10 according to the exemplaryembodiment is described for an example case where the process controller101 has the functions as the measurement device 101 a and the powersupply controller 101 b, the functions of the measurement device 101 aand the power supply controller 101 b may be implemented by a pluralityof controllers in a distributed manner.

In the plasma processing apparatus 10, however, if the plasma processingis performed on the wafer W, the upper electrode 33 is consumed. Thedegree of consumption of the upper electrode 33 increases as a totalprocessing time of the plasma processing increases. Further, in theplasma processing apparatus 10, if the upper electrode 33 is consumed,the strength of the upper electrode 33 is degraded. As a result, theupper electrode 33 is bent and a gap is generated between the upperelectrode 33 and the cooling plate 34, so that the removal of the heatof the upper electrode 33 is hindered.

FIG. 4 is a diagram for describing an example of the consumption of theupper electrode 33. An upper part of FIG. 4 illustrates a state of theupper electrode 33 when the upper electrode 33 is unused one (that is,when the total processing time of the plasma processing is 0 h). A lowerpart of FIG. 4 illustrates a state of the upper electrode 33 when thetotal processing time of the plasma processing is equal or larger than apreset time.

In the prior art, the attraction of the upper electrode 33 is carriedout by applying the regular voltage to the electrostatic chuck 41 (thatis, the electrode plate 42).

Meanwhile, in case of attracting the upper electrode 33 by applying theregular voltage to the electrode plate 42, the attraction force of theelectrostatic chuck 41 is maintained constant regardless of the degreeof consumption of the upper electrode 33. Accordingly, if the strengthof the upper electrode 33 is weakened with the consumption of the upperelectrode 33, the attraction force of the electrostatic chuck 41 maybecome insufficient. By way of example, in the example shown in thelower part of FIG. 4 , if the total processing time of the plasmaprocessing is equal to or larger than the preset time, a surface of theupper electrode 33 is etched, and, thus, a thickness of the upperelectrode 33 is reduced. As a result, the strength of the upperelectrode 33 is reduced. If the strength of the upper electrode 33 isreduced, a sufficient attraction force of the electrostatic chuck 41against a force acting in a direction in which the upper electrode 33 isbent cannot be obtained. Resultantly, the adhesiveness between the upperelectrode 33 and the cooling plate 34 is degraded.

In the plasma processing apparatus 10, if the adhesiveness between theupper electrode 33 and the cooling plate 34 is degraded, the removal ofthe heat of the upper electrode 33 may be hindered, and the temperatureof the upper electrode 33 may be increased. As a result, the processingcharacteristic of the plasma processing may be deteriorated.

As a resolution, in the plasma processing apparatus 10 according to theexemplary embodiment, the second DC power supply 43 is controlled suchthat the absolute value of the DC voltage applied to the electrostaticchuck 41 is increased based on the degree of consumption of the upperelectrode 33.

Further, the control of the second DC power supply 43 may be performedwhenever a preset total processing time of the plasma processing haselapsed, or may be performed whenever a preset total number of thewafers W are processed or whenever a preset total number of lots areprocessed. Alternatively, the control of the second DC power supply 43may be performed continuously based on the degree of consumption of theupper electrode 33. Further, a timing in which the absolute value of theDC voltage applied to the electrostatic chuck 41 is increased bycontrolling the second DC power supply 43 may be after the wafer W isprocessed and before the processing of a next wafer W is begun, or maybe during the wafer W is being processed based on the degree ofconsumption of the upper electrode 33.

Referring back to FIG. 3 , the measurement device 101 a is configured tomeasure the degree of consumption of the upper electrode 33. Forexample, the measurement device 101 a measures the total processing timeof the plasma processing and stores the measured total processing timeof the plasma processing in the consumption information 103 a indicatingthe degree of consumption of the upper electrode 33.

The power supply controller 101 b is configured to control the second DCpower supply 43 to increase the absolute value of the DC voltage appliedto the electrostatic chuck 41 based on the degree of consumption of theupper electrode 33. By way of example, the power supply controller 101 bis configured to control the second DC power supply 43 such that theabsolute value of the DC voltage applied to the electrostatic chuck 41is increased with the increase of the total processing time of theplasma processing measured by the measurement device 101 a.

In this plasma processing apparatus 10, even if the strength of theupper electrode 33 is reduced with the consumption of the upperelectrode 33, the attraction force of the electrostatic chuck 41 isenhanced as the absolute value of the DC voltage applied to theelectrostatic chuck 41 is increased, and the force acting in thedirection in which the upper electrode 33 is bent is canceled. The forceacting in the direction in which the upper electrode 33 is bent may be,by way of non-limiting example, gravity acting on the upper electrode33, a force acting on the upper electrode 33 caused by a pressure of thegas introduced into the buffer room 36, or the like. As the force actingin the direction in which the upper electrode 33 is bent is canceled bythe attraction force of the electrostatic chuck 41, the degradation ofthe adhesiveness between the upper electrode 33 and the cooling plate 34due to the consumption of the upper electrode 33 can be suppressed.

For example, in the plasma processing apparatus 10, the voltageinformation 103 b indicating the absolute value of the DC voltage ispreviously stored in the storage 103 for each value of the totalprocessing time of the plasma processing such that the absolute value ofthe DC voltage applied to the electrostatic chuck 41 is increased withthe increase of the total processing time of the plasma processing.

The power supply controller 101 b reads out from the voltage information103 b the absolute value of the DC voltage corresponding to the totalprocessing time of the plasma processing measured by the measurementdevice 101 a at a preset timing in the plasma processing on the wafer W.Then, the power supply controller 101 b controls the second DC powersupply 43 to supply a DC voltage having the read-out absolute value.

Accordingly, in the plasma processing apparatus 10, the attraction forceof the electrostatic chuck 41 can be gradually increased with theconsumption of the upper electrode 33. Therefore, the deterioration ofthe adhesiveness between the upper electrode 33 and the cooling plate 34due to the consumption of the upper electrode 33 can be suppressed.

[Flow of Control]

Now, an electrostatic attraction processing performed in the plasmaprocessing apparatus 10 according to the exemplary embodiment will bediscussed. FIG. 5 is a flowchart illustrating an example flow of theelectrostatic attraction processing according to the exemplaryembodiment. This electrostatic attraction processing is performed at apreset timing, for example, a timing when a plasma processing upon thewafer W is begun.

The power supply controller 101 b reads out the total processing time ofthe plasma processing stored in the consumption information 103 a(process S10). That is, the power supply controller 101 b reads out fromthe consumption information 103 a the total processing time of theplasma processing measured by the measurement device 101 a at the lasttime.

The power supply controller 101 b reads out the absolute value of the DCvoltage corresponding to the read-out total processing time of theplasma processing from the voltage information 103 b (process S11). Thepower supply controller 101 b controls the second DC power supply 43 toapply the DC voltage having this read-out absolute value (process S12).

The measurement device 101 a measures the total processing time of theplasma processing to which the current processing time of the plasmaprocessing is added, and stores the measurement result in theconsumption information 103 a (process S13). Then, the processing iscompleted.

As stated above, the plasma processing apparatus 10 according to theexemplary embodiment includes the cooling plate 34, the upper electrode33, the electrostatic chuck 41 provided between the cooling plate 34 andthe upper electrode 33 and configured to attract the upper electrode 33,the second DC power supply 43 configured to apply the voltage to theelectrostatic chuck 41 and the power supply controller 101 b configuredto control the absolute value of the DC voltage applied to theelectrostatic chuck 41 from the second DC power supply 43. The powersupply controller 101 b performs controlling the second DC power supply43 such that the absolute value of the DC voltage is increased based onthe degree of consumption of the upper electrode 33. Accordingly, theplasma processing apparatus 10 is capable of suppressing thedeterioration of the adhesiveness between the upper electrode 33 and thecooling plate 34 caused by the consumption of the upper electrode 33. Asa result, the plasma processing apparatus 10 is capable of suppressingthe temperature rise of the upper electrode 33 by improving theefficiency for the removal of the heat of the upper electrode 33.Therefore, the processing characteristic of the plasma processing can bebettered.

Further, the plasma processing apparatus 10 according to the exemplaryembodiment further includes the measurement device 101 a. Themeasurement device 101 a measures the total processing time of theplasma processing. The power supply controller 101 b controls the secondDC power supply 43 to increase the absolute value of the DC voltageapplied to the electrode plate 42 with the increase of the measuredtotal processing time of the plasma processing. Accordingly, the plasmaprocessing apparatus 10 is capable of increasing the attraction force ofthe electrostatic chuck 41 gradually with the increase of the totalprocessing time of the plasma processing. Therefore, the deteriorationof the adhesiveness between the upper electrode 33 and the cooling plate34 caused by the consumption of the upper electrode 33 can besuppressed.

The above-described exemplary embodiment is not meant to be anywaylimiting. The exemplary embodiment can be changed and modified invarious ways. By way of example, the above exemplary embodiment has beendescribed for the example where the degree of consumption of the upperelectrode 33 is measured by measuring the total processing time of theplasma processing with the measurement device 101 a. However, the methodof measuring the degree of consumption of the upper electrode 33 is notlimited thereto. For example, the plasma processing apparatus 10 maymeasure the degree of consumption of the upper electrode 33 bymeasuring, with the measurement device 101 a, a difference between atemperature of the upper electrode 33 and a previously measuredtemperature of an unused upper electrode 33 during the processing periodof the plasma processing. For example, in the plasma processingapparatus 10, a thermometer configured to measure a temperature by anoptical fiber, a thermometer configured to measure a temperature byoptical interference, or the like may be provided at a member locatedabove the upper electrode 33 to measure the difference between thetemperature of the upper electrode 33 and the previously measuredtemperature of the unused upper electrode 33. The member above the upperelectrode 33 may be, by way of non-limiting example, the cooling plate34. In the plasma processing apparatus 10, if the strength of the upperelectrode 33 is reduced due to the consumption of the upper electrode33, the enough attraction force of the electrostatic chuck 41 againstthe force acting in the direction in which the upper electrode 33 isbent may not be obtained. As a result, the adhesiveness between theupper electrode 33 and the cooling plate 34 is weakened. The forceacting in the direction in which the upper electrode 33 is bent may be,by way of non-limiting example, the gravity acting on the upperelectrode 33, the force acting on the upper electrode 33 caused by thepressure of the gas introduced into the buffer room 36, or the like. Ifthe adhesiveness between the upper electrode 33 and the cooling plate 34is weakened, the difference between the temperature of upper electrode33 and the previously measured temperature of the unused upper electrode33 is increased. Thus, the power supply controller 101 b controls thesecond DC power supply 43 to increase the absolute value of the DCvoltage applied to the electrostatic chuck 41 at a timing when themeasured difference between the temperature of the upper electrode 33and the previously measured temperature of the unused upper electrode 33exceeds a predetermined threshold value. As a consequence, in the plasmaprocessing apparatus 10, the deterioration of the adhesiveness betweenthe upper electrode 33 and the cooling plate 34 due to the consumptionof the upper electrode 33 can be suppressed. Moreover, the power supplycontroller 101 b may control the second DC power supply 43 to increasethe absolute value of the voltage applied to the electrostatic chuck 41from zero to a value larger than zero (e.g., 2500 V) at theaforementioned timing. That is, for a preset period after the plasmaprocessing is begun, the upper electrode 33 is held by the clamp member40 and the power supply controller 101 b controls the second DC powersupply 43 such that the voltage is not applied to the electrostaticchuck 41. Afterwards, at a time point when the difference between themeasured temperature of the upper electrode 33 and the previouslymeasured temperature of the unused upper electrode 33 exceeds the presetthreshold value, the second DC power supply 43 may be controlled suchthat the voltage is applied to the electrostatic chuck 41.

Moreover, in the above-described exemplary embodiment, the singleelectrostatic chuck 41 is provided on the entire fixing surface 34 a ofthe cooling plate 34, and this electrostatic chuck 41 attracts the upperelectrode 33. However, the exemplary embodiment is not limited thereto,and multiple electrostatic chucks may be provided. The electrostaticchuck 41 may be divided into a central electrostatic chuck and aperipheral electrostatic chuck. For example, the central electrostaticchuck is provided on a region of the fixing surface 34 a of the coolingplate 34 corresponding to a central portion of the upper electrode 33.Meanwhile, the peripheral electrostatic chuck is provided on a region ofthe fixing surface 34 a of the cooling plate 34 corresponding to theperipheral portion of the upper electrode 33. An electrode plate of thecentral electrostatic chuck and an electrode plate of the peripheralelectrostatic chuck are electrically connected with the second DC powersupply 43. The second DC power supply 43 applies the DC voltage to theelectrode plate of the central electrostatic chuck and the electrodeplate of the peripheral electrostatic chuck independently under thecontrol of the controller 100. Thus, if the strength of the upperelectrode 33 is degraded due to the consumption of the upper electrode33, the central portion of the upper electrode 33, which is not pressedagainst the fixing surface 34 a by the clamp member 40, may be easilybent. In consideration of this, the power supply controller 101 bcontrols the second DC power supply 43 to increase the absolute value ofthe DC voltage applied to the central electrostatic chuck based on thedegree of consumption of the upper electrode 33 while maintainingconstant the absolute value of the DC voltage applied to the peripheralelectrostatic chuck. Therefore, the plasma processing apparatus 10 iscapable of suppressing the degradation of the adhesiveness between theupper electrode 33 and the cooling plate 34 due to the consumption ofthe upper electrode 33 more efficiently.

According to the exemplary embodiment, it is possible to suppress thedeterioration of the adhesiveness between the upper electrode and thecooling plate.

From the foregoing, it will be appreciated that various embodiments ofthe present disclosure have been described herein for purposes ofillustration, and that various modifications may be made withoutdeparting from the scope and spirit of the present disclosure.Accordingly, the various embodiments disclosed herein are not intendedto be limiting. The scope of the inventive concept is defined by thefollowing claims and their equivalents rather than by the detaileddescription of the exemplary embodiments. It shall be understood thatall modifications and embodiments conceived from the meaning and scopeof the claims and their equivalents are included in the scope of theinventive concept.

The claims of the present application are different and possibly, atleast in some aspects, broader in scope than the claims pursued in theparent application. To the extent any prior amendments orcharacterizations of the scope of any claim or cited document madeduring prosecution of the parent could be construed as a disclaimer ofany subject matter supported by the present disclosure, Applicantshereby rescind and retract such disclaimer. Accordingly, the referencespreviously presented in the parent applications may need to berevisited.

We claim:
 1. A plasma processing apparatus, comprising: a showerheadincluding a cooling plate, an upper electrode, and an electrostaticchuck provided between the cooling plate and the upper electrode; apower supply configured to apply a voltage to the electrostatic chuck;and a controller configured to control the power supply such that anabsolute value of the voltage applied to the electrostatic chuck fromthe power supply increases based on a degree of consumption of the upperelectrode.
 2. The plasma processing apparatus of claim 1, furthercomprising: a measurement device configured to measure a totalprocessing time of a plasma processing, wherein the controller isfurther configured to perform: measuring the total processing time ofthe plasma processing by the measurement device; and determining thedegree of consumption of the upper electrode based on the measured totalprocessing time.
 3. The plasma processing apparatus of claim 1, furthercomprising: a measurement device configured to measure a totalprocessing time of a plasma processing; and a storage configured tostore the absolute value, wherein the controller is further configuredto perform: storing, in the storage, voltage information indicating theabsolute value corresponding to the total processing time such that theabsolute value increases as the total processing time of the plasmaprocessing increases; measuring the total processing time of the plasmaprocessing by the measurement device; reading out, from the storage, thevoltage information corresponding to the total processing time; andapplying, to the electrostatic chuck, the voltage corresponding to theread-out voltage information.
 4. The plasma processing apparatus ofclaim 1, further comprising: a measurement device configured to measurea total processing time of a plasma processing; and a storage configuredto store relationship between consumption information indicating thedegree of consumption of the upper electrode and voltage informationindicating the absolute value, wherein the controller is furtherconfigured to perform: determining the absolute value by referring tothe relationship.
 5. The plasma processing apparatus of claim 1, whereinthe controller is further configured to perform the controlling of thepower supply after a wafer is processed and before a next wafer isprocessed.
 6. The plasma processing apparatus of claim 1, furthercomprising: a thermometer configured to measure a temperature of theupper electrode, wherein the controller is further configured toperform: measuring the temperature of the upper electrode by thethermometer; calculating a difference between the measured temperatureof the upper electrode and a previously measured temperature of anunused upper electrode; and controlling, at a timing when the differenceexceeds a preset threshold value, the power supply such that theabsolute value of the voltage applied to the electrostatic chuckincreases.
 7. The plasma processing apparatus of claim 6, wherein thethermometer is a thermometer configured to measure the temperature by anoptical fiber provided at the cooling plate and/or a thermometerconfigured to measure the temperature by optical interference.
 8. Theplasma processing apparatus of claim 1, wherein the electrostatic chuckincludes a central electrostatic chuck and a peripheral electrostaticchuck.
 9. The plasma processing apparatus of claim 8, wherein the powersupply is further configured to independently apply the voltage to thecentral electrostatic chuck and the peripheral electrostatic chuck. 10.The plasma processing apparatus of claim 9, wherein, in the controllingof the power supply, the controller controls the power supply toincrease the absolute value of the voltage applied to the centralelectrostatic chuck based on the degree of consumption of the upperelectrode while maintaining constant the absolute value of the voltageapplied to the peripheral electrostatic chuck.
 11. A plasma processingapparatus, comprising: a showerhead including a cooling plate, an upperelectrode, and at least one electrostatic chuck provided between thecooling plate and the upper electrode; a power supply configured toapply a voltage to the at least one electrostatic chuck; and acontroller configured to control the power supply so that the voltageapplied to the at least one electrostatic chuck is changed based on oneor more parameters related to a consumption of the upper electrode. 12.The plasma processing apparatus of claim 11, wherein the one or moreparameters are selected from the group consisting of a processing time,a number of processed wafers, a number of processed lots, a degree ofconsumption of the upper electrode, and combinations thereof.
 13. Theplasma processing apparatus of claim 11, wherein the at least oneelectrostatic chuck is configured as a unipolar type.
 14. The plasmaprocessing apparatus of claim 13, further comprising: a clamp configuredto press a peripheral portion of the upper electrode against the coolingplate, wherein in a first period, the upper electrode is held by the atleast one electrostatic chuck under plasma generation, and in a secondperiod, the upper electrode is held by the clamp without plasmageneration.
 15. The plasma processing apparatus of claim 11, wherein theat least one electrostatic chuck is configured as a bipolar type. 16.The plasma processing apparatus of claim 11, further comprising: athermometer configured to measure a temperature of the upper electrode.17. The plasma processing apparatus of claim 16, wherein the controlleris further configured to control the power supply so that the voltage isapplied to the at least one electrostatic chuck when a differencebetween the temperature of the upper electrode measured by thethermometer and a reference temperature exceeds a threshold.
 18. Theplasma processing apparatus of claim 11, wherein the at least oneelectrostatic chuck includes a plurality of electrostatic chucks. 19.The plasma processing apparatus of claim 11, wherein the at least oneelectrostatic chuck includes a central electrostatic chuck and aperipheral electrostatic chuck.
 20. The plasma processing apparatus ofclaim 19, wherein the power supply is further configured to apply thevoltage to the central electrostatic chuck, and the controller isfurther configured to control the power supply so that the voltageapplied to the central electrostatic chuck is changed based the on theone or more parameters.
 21. The plasma processing apparatus of claim 20,further comprising: an additional power supply configured to apply avoltage to the peripheral electrostatic chuck.
 22. A plasma processingapparatus, comprising: a showerhead including a cooling plate, an upperelectrode, and at least one electrostatic chuck provided between thecooling plate and the upper electrode; a power supply configured toapply a voltage to the at least one electrostatic chuck; and acontroller configured to control the power supply so that the voltageapplied to the at least one electrostatic chuck is changed based on oneor more parameters selected from the group consisting of a processingtime, a number of processed wafers, a number of processed lots, a degreeof consumption of the upper electrode, and combinations thereof.